研究者情報 | 神奈川大学

チカライシ　ノリコ Chikaraishi Noriko 力石　紀子所属神奈川大学理学部理学科職種助教
言語種別	英語
発行・発表の年月	2021/11
形態種別	学術雑誌
査読	査読あり
標題	Photodegradable self-assembled monolayers bearing polyhedral oligosilsesquioxanes on metal oxides for the patterned deposition of silver nanoparticle ink and organic semiconductor
執筆形態	共著
掲載誌名	Materials Chemistry and Physics
掲載区分	国外
出版社・発行元	Elsevier
巻・号・頁	277,pp.125467
担当範囲	Noriko Chikaraishi Kasuga wrote the manuscript with support from Kazuo Yamaguchi. Takuma Igari, Noriko Chikaraishi Kasuga and Kazuo Yamaguchi conceived the original idea.
著者・共著者	Takuma Igari, Yuta Ono, Kohei Shigeta, Takahiro Ueta, Noriko Chikaraishi Kasuga, Kazuo Yamaguchi
概要	Three surface modifiers consisting of three parts were synthesized to fabricate photo-patternable self-assembled monolayers (SAMs) on inorganic materials for pattern-transformation; the first part is the one that binds to the surface of metal oxides (trialkoxysilane or phosphonic acid with an amino group at the end), the second is an onitrobenzyl(ONB) linker that protects the amino group, and the third is a hydrophobic polyhedral oligomeric silsesquioxane (POSS) that is connected to the linker. The immobilized silicon wafer with a silane coupling agent or indium tin oxide with the phosphonic acid became nearly as hydrophobic as the silicon surface-modified with perfluoroalkyl agents. After photoirradiation, the second and third parts (ONB linker with the POSS moiety) were removed and the modified surfaces became hydrophilic owing to the appearance of amino groups.